Vacuum insulated glass units and methodology for manufacturing the same

ABSTRACT

A vacuum insulated glass unit includes a first and a second glass pane and a pane bonding layer. The first and second glass panes each include a vacuum chamber side opposite an outer side. The vacuum chamber side of the first glass pane includes an etched interior surface, a glass pane periphery having a periphery surface, and a plurality of glass spacers each having an end surface. The pane bonding layer is positioned between and engaged with the periphery surface of the glass pane periphery of the first glass pane and the second glass pane and couples the first glass pane to the second glass pane. Each end surface of the plurality of glass spacers and the periphery surface of the glass pane periphery are offset from the etched interior surface such that a vacuum chamber is disposed between the first and the second glass panes.

This application is a divisional of U.S. application Ser. No.15/336,879, filed Oct. 28, 2016, which claims the benefit of priorityunder 35 U.S.C. § 119 of U.S. Provisional Application Ser. No.62/248,715 filed on Oct. 30, 2015, the content of which is relied uponand incorporated herein by reference in its entirety.

BACKGROUND

The present disclosure relates to vacuum insulated glass units. Morespecifically, the present disclosure introduces technology for vacuuminsulated glass units and vacuum insulated glass units with chemicallyetched glass spacers and bonded glass panes.

BRIEF SUMMARY

According to the subject matter of the present disclosure, a vacuuminsulated glass unit includes a first glass pane, a second glass pane,and a pane bonding layer. In embodiments, the first and second glasspanes each include a vacuum chamber side opposite an outer side. Inembodiments, the vacuum chamber side of the first glass pane includes anetched interior surface, a glass pane periphery having a peripherysurface, and a plurality of glass spacers each having an end surface. Inembodiments, the pane bonding layer is positioned between and bondedwith the periphery surface of the glass pane periphery of the firstglass pane and the vacuum chamber side of the second glass pane, suchthat the pane bonding layer couples the first glass pane to the secondglass pane. In embodiments, each end surface of the plurality of glassspacers and the periphery surface of the glass pane periphery are offsetfrom the etched interior surface such that a vacuum chamber is disposedbetween the etched interior surface of the first glass pane and thevacuum chamber side of the second glass pane.

In accordance with one embodiment of the present disclosure, a method ofmanufacturing a vacuum insulated glass unit is disclosed. Inembodiments, the method includes depositing a pane bonding layer onto avacuum chamber side of a first glass pane. In embodiments, the methodincludes depositing an etching mask layer onto a plurality of maskinglocations along the vacuum chamber side of the first glass pane suchthat the pane bonding layer is positioned between the first glass paneand the etching mask layer. In embodiments, the method includescontacting the vacuum chamber side of the first glass pane with achemical etchant to remove a depth of glass pane material and remove thepane bonding layer from unmasked portions of the vacuum chamber side ofthe first glass pane, such that the vacuum chamber side of the firstglass pane includes an etched interior surface, a glass pane periphery,and a plurality of glass spacers. In embodiments, the plurality of glassspacers and the glass pane periphery extend from the etched interiorsurface. In embodiments, the pane bonding layer is positioned on theglass pane periphery. In embodiments, the method further includesremoving the etching mask layer and bonding a second glass pane with thepane bonding layer positioned on the glass pane periphery of the firstglass pane.

In accordance with another embodiment of the present disclosure, amethod of manufacturing a vacuum insulated glass unit. In embodiments,the method includes depositing an etching mask layer onto a plurality ofmasking locations along a vacuum chamber side of a first glass pane. Inembodiments, the method includes contacting the vacuum chamber side ofthe first glass pane with a chemical etchant to remove a depth of glasspane material from unmasked portions of the vacuum chamber side of thefirst glass pane, such that the vacuum chamber side of the first glasspane includes an etched interior surface, a glass pane periphery, and aplurality of glass spacers. In embodiments, the plurality of glassspacers and the glass pane periphery extend from the etched interiorsurface. In embodiments, the method includes removing the etching masklayer. In embodiments, the method includes positioning a second glasspane having a low-emissivity layer on a vacuum chamber side of thesecond glass pane in contact with the glass pane periphery of the firstglass pane. In embodiments, the method includes irradiating thelow-emissivity layer of the second glass pane contacting the glass paneperiphery of the first glass pane with a bonding laser to fuse thelow-emissivity layer contacting the glass pane periphery and seal thefirst glass pane to the second glass pane.

Although the concepts of the present disclosure are described hereinwith primary reference to some specific vacuum insulated glass unitconfigurations, it is contemplated that the concepts will enjoyapplicability to vacuum insulated glass units having any configuration.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The following detailed description of specific embodiments of thepresent disclosure can be best understood when read in conjunction withthe following drawings, where like structure is indicated with likereference numerals and in which:

FIG. 1 is a schematic cross-sectional illustration of a vacuum insulatedglass unit having a pane bonding layer positioned between a first glasspane and a second glass pane, according to one or more embodiments shownand described herein;

FIG. 2 is a schematic cross-sectional illustration of a vacuum insulatedglass unit having an anti-friction layer positioned between a firstglass pane and a second glass pane, according to one or more embodimentsshown and described herein;

FIG. 3 is a schematic cross-sectional illustration of a vacuum insulatedglass unit having a low-emissivity layer positioned between a firstglass pane and a second glass pane, according to one or more embodimentsshown and described herein;

FIG. 4A is a schematic cross-sectional illustration of a first glasspane for use in a method of manufacturing the vacuum insulated glassunits of FIGS. 1-3, according to one or more embodiments shown anddescribed herein;

FIG. 4B is a schematic cross-sectional illustration of a pane bondinglayer positioned on the first glass pane of FIG. 4A, according to one ormore embodiments shown and described herein;

FIG. 4C is a schematic cross-sectional illustration of an anti-frictionlayer positioned on the first glass pane of FIG. 4A, according to one ormore embodiments shown and described herein;

FIG. 4D is a schematic cross-sectional illustration of an etching masklayer positioned on the first glass pane of FIG. 4A, according to one ormore embodiments shown and described herein;

FIG. 4E is a schematic cross-sectional illustration of the first glasspane of FIGS. 4A-4D after contact with a chemical etchant, according toone or more embodiments shown and described herein;

FIG. 4F is a schematic cross-sectional illustration of the chemicallyetched first glass pane of FIG. 4E after removal of the etching masklayer, according to one or more embodiments shown and described herein;

FIG. 4G is a schematic cross-sectional illustration of a second glasspane in contact with the chemically etched first glass pane of FIG. 4F,according to one or more embodiments shown and described herein; and

FIG. 5 is schematic illustration of a vacuum chamber side of a firstglass pane having an etching mask layer positioned at a plurality ofmaking locations, according to one or more embodiments shown anddescribed herein.

DETAILED DESCRIPTION

FIG. 1 is a schematic illustration of a vacuum insulated glass unit 100.The vacuum insulated glass unit 100 comprises a first glass pane 110, asecond glass pane 120, and a pane bonding layer 140. The first andsecond glass panes 110, 120 each include a vacuum chamber side 112, 122opposite an outer side 114, 124. The vacuum chamber side 112 of thefirst glass pane 110 may comprise an etched interior surface 118, aglass pane periphery 116, and a plurality of glass spacers 130 eachcomprising an end surface 132. The glass pane periphery 116 may belocated along a perimeter 119 of the first glass pane 110 and includes aperiphery surface 117. The plurality of glass spacers 130 and the glasspane periphery 116 may extend integrally from the etched interiorsurface 118. The glass pane periphery 116 may terminate at the peripherysurface 117 and the plurality of glass spacers 130 each terminate at theend surface 132. Further, each end surface 132 of the plurality of glassspacers 130 and the periphery surface 117 of the glass pane periphery116 are offset from the etched interior surface 118 such that a vacuumchamber 102 is disposed between the etched interior surface 118 of thefirst glass pane 110 and the vacuum chamber side 122 of the second glasspane 120. In embodiments, each end surface of the plurality of glassspacers is substantially flat. In embodiments, each end surface of theplurality of glass spacers has a radius of curvature greater than 2600microns. In embodiments, the glass pane including the etched surfaceprovides for visible light transmission there thorough within +/−5%transmission of the glass pane before etching.

The pane bonding layer 140 is positioned between and bonded with theperiphery surface 117 of the first glass pane 110 and the vacuum chamberside 122 of the second glass pane 120, such that the pane bonding layer140 couples the first glass pane 110 to the second glass pane 120. Thepane bonding layer 140 may also be disposed on the end surfaces 132 ofthe plurality of glass spacers 130. The pane bonding layer 140 maycomprise a low melting point glass, a glass frit, a low-emissivitymaterial (e.g., the material of a low-emissivity layer 144), a metalsolder, such as indium solder, an inorganic material, such as, SnO₂,ZnO, TiO₂, ITO, Zn, Ce, Pb, Fe, VA, Cr, Mn, Mg, Ge, SnF₂, ZnF₂, andcombinations thereof. Further, the pane bonding layer 140 may comprise athickness of between about 0.1 μm and about 300 μm, for example, 1 μm, 3μm, 5 μm, 10 μm, 15 μm, 25 μm, 50 μm, and for example, between about 0.5μm and about 100 μm.

The pane bonding layer 140 may be compositionally configured to fuseupon absorption of radiation at wavelengths between about 300 nm andabout 1600 nm, for example, between about 750 nm to about 1600 nm,between about 420 nm to about 750 nm, or the like, output by a bondinglaser operating at between about 1 W and about 25 W, for example,between about 10 W and about 20 W and bond the first glass pane 110 tothe second glass pane 120. Further, a wavelength of absorption orwavelength range of absorption may be predetermined based on thematerial of the pane bonding layer 140, such that at least about 10% ofthe laser energy output by the bonding laser is absorbed by the panebonding layer 140.

The pane bonding layer 140 may also be compositionally configured tobond the first glass pane 110 to the second glass pane 120 upon exposureto ultrasonic energy (e.g., ultrasonic energy between about 10 kHz andabout 100 MHz) or upon exposure to heat, such as heat applied by afurnace at a temperature less than or equal to a softening temperatureof soda lime glass, for example, between about 250° C. and about 750° C.Further, the pane bonding layer 140 may comprise a softening temperaturewithin a range of temperatures that are at least partially exclusive ofa range of softening temperatures of each of the first and second glasspanes 110, 120. For example, the pane bonding layer 140 may comprise asoftening temperature lower than a softening temperature of the firstand second glass panes 110, 120, such that the plug bonding layer 180may fuse without deforming adjacent portions of the first and secondglass pane 110, 120.

The first glass pane 110 and the second glass pane 120 may comprise anyglass composition suitable as a vacuum insulated window. For example,the first and second glass panes 110, 120 may comprise soda-lime glass,such as, soda-lime float glass, alumino silicate glass, borosilicateglass, Gorilla® Glass, or the like. The first glass pane 110 and thesecond glass pane 120 may also comprise tempered glass, such as heattempered glass, chemically tempered glass, or the like. The first andsecond glass panes 110 may also comprise any thickness, for example,between about 3 mm and about 12 mm, such as 4 mm, 6 mm, 8 mm, or thelike. The first and second glass panes 110, 120 may have the samethickness or may have different thicknesses. For example, when the firstglass pane 110 comprises the etched interior surface 118, the thicknessof the etched interior surface 118 may be equal to the thickness of thesecond glass pane 120, for example about 3 mm. Further, before theetched interior surface 118 is etched into the first glass pane 110, thefirst glass pane 110 may be thicker than the second glass pane 120. Forexample, the pre-etched first glass pane 110 may comprise a thickness ofabout 5 mm and the second glass pane 120 may comprise a thickness ofabout 3 mm.

Referring still to FIG. 1, the plurality of glass spacers 130 arepositioned in a spacer array such that each glass spacer 130 ispositioned between about 10 mm and about 100 mm from an adjacent glassspacer, for example, 20 mm, 30 mm, 40 mm, or the like, or between about10 mm and about 50 mm. It should be understood that any spacer arrayconfiguration is contemplated. Further, the end surfaces 132 of theplurality of glass spacers 130 are each offset from the etched interiorsurface 118, for example, between about 50 μm and about 300 μm, such asbetween about 80 μm and about 200 μm. Moreover, the end surfaces 132 maycomprise a cross sectional diameter or cross sectional length and/orwidth between about 50 μm and about 300 μm, for example, between about100 μm and about 200 μm. Alternatively, the plurality of glass spacers130 may be formed according to the laser-induced methods provided inU.S. Patent Publication 2012/0247063 the entire contents of which isincorporated by reference herein.

In operation, the plurality of glass spacers 130 are structurallyconfigured to maintain separation of the first glass pane 110 and thesecond glass pane 120 when the vacuum chamber 102 comprises a pressurebelow atmospheric pressure, for example, after gas is removed from thevacuum chamber 102. In one embodiment, end surface 132 of the pluralityof glass spacers 103 etched from first glass pane 110 contact the secondglass pane 120 to maintain separation.

The plurality of glass spacers 130 may each comprise a compressivestrength of between about 5 MPa and about 50 MPa, such as about 10 MPa,20 MPa, 25 MPa, 35 MPa, 45 MPa, or the like. At least one of theplurality of glass spacers 130 may comprise a load resistance of 1800kilograms or more, 2000 kilograms or more, of 3600 kilograms or more, orfrom about 1800 kilograms to about 3600 kilograms. In embodiments, theload resistance of a glass spacer 130 is confirmed when the glass spaceris not cracked, crushed, or irreversibly deformed by the above disclosedapplied load normal to an end surface thereof. When the plurality ofglass spacers 130 comprising increased compressive strength (e.g., whenboth glass panes are heat tempered) or increased load resistance, fewerglass spacers 130 may be needed to maintain separation of the firstglass pane 110 and the second glass pane 120, reducing the thermaltransmittance across the vacuum insulated glass unit 100. Increasing thecompressive strength or load resistance of the plurality of glassspacers 130 may also increase the lifetime of the vacuum insulated glassunit 100. Further, the plurality of glass spacers 130 may comprise athermal transmittance of between about 0.2 W/mK and about 1.4 W/mK, suchas about 0.6 W/mK, about 0.7 W/mK about 1 W/mK, about 1.1 W/mK, or thelike. Moreover, the end surfaces 132 of the plurality of glass spacers130 may each comprise a surface roughness of between about 0.02 μm/20 mmpeak-to-peak and about 0.3 μm/20 mm peak-to-peak. For example, the endsurfaces 132 of the glass spacers 130 may each comprise a surfaceroughness equal to a surface roughness of the vacuum chamber side 112,122 of the first and second glass panes 110, 120.

Referring now to FIG. 2, the vacuum insulated glass unit 100 maycomprise an anti-friction layer 142 positioned on the end surface 132 ofat least one of the plurality of glass spacers 130. The anti-frictionlayer 142 may be positioned directly on the end surfaces 132 of theplurality of glass spacers 130. Further, the pane bonding layer 140 maybe positioned between the end surfaces 132 of the plurality of glassspacers 130 and the anti-friction layer 142 (FIGS. 4E-4G). Theanti-friction layer 142 may comprise a transparent or an opaquematerial, for example, WS₂, MoS₂, or combinations thereof. Moreover, theanti-friction layer 142 may comprise any material compositionallyconfigured to reduce the friction between glass components, for example,between the end surfaces 132 of the plurality of glass spacers 130 andthe vacuum chamber side 122 of the second glass pane 120.

In operation, the vacuum insulated glass unit 100 may be located invariable thermal environments, which may cause thermal expansion andretraction of the vacuum insulated glass unit 100. For example, when thevacuum insulated glass unit 100 is installed in a structure, one of thefirst or second glass panes 110, 120 may face the interior of thestructure and the other of the first or second glass panes 110, 120 mayface the exterior environment, creating a thermal gradient which maycause thermal expansion and retraction of the first and second glasspanes 110, 120. The anti-friction layer 142 may reduce or prevent damageto the first and/or second glass panes 110, 120 caused by the relativemotion of the glass spacers 130 along the vacuum chamber side 122 of thesecond glass pane 120 due to thermal expansion and retraction.

Referring now to FIG. 3, the low-emissivity layer 144 may be positionedon the vacuum chamber side 112 of the first glass pane 110, the vacuumchamber side 122 of the second glass pane 120, or both. Thelow-emissivity layer 144 may comprise a tin oxide, such as indium tinoxide or fluorine doped tin oxide, silver, metallic silver, metallicnickel, silicon nitride, zirconium oxide, zinc oxide, gold oxide, orcombinations thereof. The low-emissivity layer 144 is compositionallyconfigured to reflect radiant heat and permit transmission of visibleradiation upon exposure to solar radiation. Further, the low-emissivitylayer 144 may be deposited on and engaged with the vacuum chamber side112 of the first glass pane 110 and the vacuum chamber side 122 of thesecond glass pane 120 and may be used as the pane bonding layer 140 tohermetically seal the vacuum chamber 102. The low-emissivity layer 144may be deposited using a sputtering process, mechanical depositionprocess, a manual deposition process, a chemical vapor deposition, apyrolysis processes, a spray coating process, a photolithographicprocess, a screen printing process, a 3D printing process, an inkjetprinting process, such as a piezoelectric inkjet printing process, or acombination thereof.

For example, the low-emissivity layer 144 may be compositionallyconfigured to fuse upon absorption of radiation at wavelengths betweenabout 300 nm and about 1600 nm, for example, between about 750 nm toabout 1600 nm, between about 420 nm to about 750 nm, or the like, outputby a bonding laser operating at between about 1 W and about 25 W, forexample, between about 10 W and about 20 W and bond the first glass pane110 to the second glass pane 120. The low-emissivity layer 144 may alsobe compositionally configured to bond the first glass pane 110 to thesecond glass pane 120 upon exposure to ultrasonic energy (e.g.,ultrasonic energy between about 10 kHz and about 100 MHz) or uponexposure to heat, such as heat applied by a furnace at a temperatureless than or equal to a softening temperature of soda lime glass, forexample, between about 250° C. and about 750° C.

Referring now to FIGS. 4A-4G, a method of manufacturing the vacuuminsulated glass unit 100 is schematically depicted. The method isdepicted in FIGS. 4A-4G as comprising a number of steps, however, itshould be understood that other non-depicted steps may be contemplated.While the steps of the method are described in a particular order, otherorders are contemplated. Further, while FIGS. 4A-4G depict a method ofmanufacturing a planar vacuum insulated glass unit 100, the method mayalso be applied to the manufacture of a curved vacuum insulated glassunit comprising curved glass panes.

Referring now to FIGS. 4A and 4B, the method may first comprisedepositing the pane bonding layer 140 onto the vacuum chamber side 112of the first glass pane 110. The pane bonding layer 140 may be depositedonto the vacuum chamber side 112 of the first glass pane 110 using asputtering process, mechanical deposition process, a manual depositionprocess, a chemical vapor deposition, a pyrolysis processes, a spraycoating process, a photolithographic process, a screen printing process,a 3D printing process, an inkjet printing process, such as apiezoelectric inkjet printing process, or a combination thereof.

Referring now to FIG. 4C, the method may further comprise depositing ananti-friction mask layer 160 (e.g., a masking layer for blockingdeposition of the anti-friction layer 142) along the perimeter 119 ofthe vacuum chamber side 112 of the first glass pane 110, for example,onto the portion of the pane bonding layer 140 positioned along theperimeter 119 of the first glass pane 110. The anti-friction mask layer160 may comprise any material compositionally configured to block theanti-friction layer 142 from contacting and engaging the first andsecond glass panes 110, 120, for example, masking tape or othertemporary masking adhesive, polysilicon, amorphous silicon, siliconcarbide, titanium nitride, inkjet printed masks (e.g., acrylaten-vinylcaprolactam), acrylate polymers, or a combination thereof. Theanti-friction mask layer 160 may be deposited using a mechanicaldeposition process, a manual deposition process, a chemical vapordeposition process, a photolithographic process, a screen printingprocess, a 3D printing process, an inkjet printing process, such as apiezoelectric inkjet printing process, or a combination thereof.

Next, referring still to FIG. 4C, the anti-friction layer 142 may bedeposited onto the vacuum chamber side 112 of the first glass pane 110.The anti-friction layer 142 may be deposited using a mechanicaldeposition process, a manual deposition process, a chemical vapordeposition process, a photolithographic process, a screen printingprocess, a 3D printing process, an inkjet printing process, such as apiezoelectric inkjet printing process, or a combination thereof. Theanti-friction layer 142 may be deposited onto the vacuum chamber side112 of the first glass pane 110 at locations corresponding to the etchedinterior surface 118 and the plurality of glass spacers 130 of themanufactured vacuum insulated glass units 100 depicted in FIGS. 1-3,such that the end surfaces 132 of the plurality of glass spacers 130 maycomprise the anti-friction layer 142 after the manufacturing process iscompleted. Further, by first depositing the anti-friction mask layer 160along the perimeter 119 of the vacuum chamber side 112 of the firstglass pane 110, the anti-friction layer 142 may be prevented fromengaging with portions of the vacuum chamber side 112 positioned alongthe perimeter 119. This allows the pane bonding layer 140 to bepositioned between the first and second glass panes 110, 120 without theanti-friction layer 142 separating the pane bonding layer 140 from thefirst and second panes 110, 120.

Referring now to FIG. 4D, an etching mask layer 150 may be depositedonto a plurality of masking locations 152 along the vacuum chamber side112 of the first glass pane 110 such that the pane bonding layer 140 ispositioned between the first glass pane 110 and the etching mask layer150. The etching mask layer 150 may comprise any materialcompositionally configured to block a chemical etchant from contactingthe first and second glass panes 110, 120, for example, aluminum,polysilicon, amorphous silicon, silicon carbide, titanium nitride,inkjet printed masks (e.g., acrylate n-vinylcaprolactam), masking tape,acrylate polymers, or a combination thereof. In embodiments, etchingmask layer 150 may also include ultraviolet (UV) or heat curablepolymers. The etching mask layer 150 may be deposited using a mechanicaldeposition process, a manual deposition process, a chemical vapordeposition process, a photolithographic process, a screen printingprocess, a 3D printing process, an inkjet printing process, such as apiezoelectric inkjet printing process, or a combination thereof.

Referring also to FIG. 5, the masking locations 152 may correspond tolocations along the vacuum chamber side 122 where the end surfaces 132of the plurality of glass spacers 130 and the periphery surface 117 ofthe glass pane periphery 116 are each desired. For example, the etchingmask layer 150 may be deposited along the perimeter 119 of the firstglass pane 110 and may be deposited at a number of discrete locationscorresponding to the spacer array of the plurality of glass spacers 130.Further, the etching mask layer 150 and the anti-friction mask layer 160may comprise the same masking material or may comprise different maskingmaterials. When the etching mask layer 150 and the anti-friction masklayer 160 comprise the same material, the anti-friction mask layer 160may not need to be removed before the etching mask layer 150 isdeposited onto the plurality of masking locations 152. For example, theanti-friction mask layer 160 may remain along the perimeter 119 and theetching mask layer 150 may be deposited at the plurality of maskinglocations 152 corresponding with the desired locations of the endsurfaces 132 of the plurality of glass spacers 130.

Referring now to FIG. 4E, the method of manufacturing the vacuuminsulated glass unit 100 further comprises contacting the vacuum chamberside 112 of the first glass pane 110 with a chemical etchant to remove adepth of glass pane material, remove the anti-friction layer 142, andremove the pane bonding layer 140 from unmasked portions of the vacuumchamber side 112 of the first glass pane 110. The chemical etchant maycomprise a wet chemical etchant such as hydrochloric acid (HCl),hydrofluoric acid (HF), ammonium fluoride (NH₄F), or a combinationthereof. For example, the wet chemical etchant may comprise a mixture ofbetween about 5 and 15 parts HF and 1 part HCl, for example about 10parts HF and about 1 part HCl. In embodiments, the wet chemical etchantmay comprise a mixture a mixture from about 10 weight precent (wt. %) toabout 30 wt. % HF and from about 0 wt. % to about 10 wt. % HCl. Further,the chemical etchant may comprise a plasma chemical etchant comprisingcarbon tetrafluoride (CF₄), sulfur hexafluoride (SF₆), nitrogentrifluoride (NF₃), chlorine (Cl₂), dichlorodifluoromethane (CCl₂F₂), ora combination thereof. In embodiments, the chemical etchant is stirredor agitated (e.g., by sonication) when contacting the first glass pane110.

Methods of manufacturing the vacuum insulated glass unit 100 may furthercomprise contacting the first glass pane with a fluid to reduce opticaldistortion through the first glass pane. In embodiments, contacting thefirst glass pane with the fluid to reduce optical distortion therethrough is completed after contacting the vacuum chamber side 112 of thefirst glass pane 110 with a chemical etchant. In embodiments, contactingthe first glass pane with the fluid improves optical quality of etchedglass pane 110 or increases visible light transmission through etchedglass pane 110. The inventors have discovered that etching the firstglass apne with a high concentration wet chemical etchant can diminishor distort the optical quality of or reduce visible light transmissionthrough the glass pane. In embodiments, the fluid is configured to cleanthe etched surface of the glass pane or remove residual etched materialfrom glass pane surface after the glass pane is contacted with a thechemical etchant. In embodiments, the fluid is a mineral acid. Inembodiments, the fluid includes hydrochloric acid (HCl), nitric acid(HNO₃), sulfuric acid (H₂SO₄), or combinations thereof.

Further, during chemical etching, the chemical etchant may undercut themasking locations 152 during the etching process. To account for thisundercut, the etching mask layer 150 may extend beyond the boundaries ofthe masking locations 152, for example, to cover a surface area betweenabout 30% and about 70% larger than the surface area of the maskinglocations 152. Positioning the etching mask layer 150 beyond theboundaries of the masking locations 152 facilitates formation of theplurality of glass spacers 130 comprising end surfaces 132 with adesired surface area and the formation of the glass pane periphery 116comprising the periphery surface 117 with a desired surface area whenthe chemical etchant undercuts the etching mask layer 150.

It is contemplated that an individual chemical etchant may becompositionally configured to remove each of the anti-friction layer142, the pane bonding layer 140, and a depth of glass pane material.Moreover, it is also contemplated that multiple chemical etchants may beused to remove each of the anti-friction layer 142, the pane bondinglayer 140, and a depth of glass pane material. For example, the methodmay comprise contacting the vacuum chamber side 112 with a firstchemical etchant compositionally configured to remove the anti-frictionlayer 142 from unmasked portions of the vacuum chamber side 112 of thefirst glass pane 110 and contacting the vacuum chamber side 112 of thefirst glass pane 110 with a second chemical etchant compositionallyconfigured to remove the pane bonding layer 140 from unmasked portionsof the vacuum chamber side 112 of the first glass pane 110. Further, themethod may comprise contacting the vacuum chamber side 112 of the firstglass pane 110 with a third chemical etchant compositionally configuredto remove a depth of glass pane material from unmasked portions of thevacuum chamber side 112 of the first glass pane 110.

As depicted in FIGS. 4E and 4F, after the chemical etchant contacts theunmasked portions of the vacuum chamber side 112 and a depth of glasspane material has been removed from unmasked portions of the vacuumchamber side 112, the unmasked portions of the vacuum chamber side 112comprise the etched interior surface 118 and the masked portions (e.g.,the masking locations 152 depicted in FIG. 5) extend from the etchedinterior surface 118 and comprise the glass pane periphery 116 and theplurality of glass spacers 130. After etching, the pane bonding layer140 may be positioned on the periphery surface 117 of the glass paneperiphery 116 and one or both of the pane bonding layer 140 and theanti-friction layer 142 may be positioned on the end surfaces 132 of theplurality of glass spacers 130. Next, the etching mask layer 150 may beremoved. In embodiments, removing the etching mask layer 150 may includecontacting the etching mask layer 150 with a fluid (e.g., water) todetach the etching mask layer 150 from the glass pane.

Referring now to FIG. 4G, the method of manufacturing the vacuuminsulated glass unit 100 may further comprise positioning a second glasspane 120 in contact with the pane bonding layer 140 positioned on theperiphery surface 117 of the first glass pane 110 and irradiating thepane bonding layer 140 positioned on the periphery surface 117 with abonding laser to fuse the pane bonding layer 140 and seal the firstglass pane 110 to the second glass pane 120. The method may furthercomprise translating the bonding laser such that a contact point of thelaser radiation output by the bonding laser translates along theperimeter 119 of the first glass pane 110 to fuse the pane bonding layer140 and seal the first glass pane 110 to the second glass pane 120 alongthe entire perimeter 119. For example, the bonding laser may betranslated along the perimeter 119 at a rate of between about 1 mm/s andabout 400 mm/s. Alternatively, the first glass pane 110 may be bonded tothe second glass pane 120 according to the bonding laser methodsprovided in U.S. Patent Publication No. 2015/0027168 the entire contentof which is incorporated by reference herein. Further, the anti-frictionlayer 142 may also be deposited on the vacuum chamber side 122 of thesecond glass pane 120, for example, before the second glass pane 120 isbonded to the first glass pane 110. When the anti-friction layer 142 isdeposited on the vacuum chamber side 122 of the second glass pane 120,the anti-friction layer 142 may be transparent.

Once the first glass pane 110 is sealed to the second glass pane 120,gas may be removed from the vacuum chamber 102 located between the firstglass pane 110 and the second glass pane 120 such that the vacuumchamber 102 comprises a pressure below atmospheric pressure to generatea vacuum within the vacuum chamber 102. Gas may be removed from thevacuum chamber 102 using gas removal systems and methods of which may belearned from conventional or yet-to-be developed teachings related tovacuum generation and vacuum chamber evacuation, for example, the vacuumchamber evacuation methods provided in co-pending U.S. ProvisionalPatent Application No. 62/248,661 (Attorney Docket No. SP15-336 PZ)filed Oct. 30, 2015 entitled “VACUUM INSULATED GLASS UNIT AND PUMPINGSYSTEM AND METHODOLOGY FOR EVACUATING THE SAME” the entire contents ofwhich is incorporate by reference herein.

The method of manufacturing the vacuum insulated glass unit 100 may alsocomprise tempering one or both of the vacuum chamber side 112, 122 andthe outer side 114, 124 of one or both of the first glass pane 110 andthe second glass pane 120, for example, by heat tempering the firstand/or second glass panes 110, 120, chemically tempering the firstand/or second glass panes 110, 120, or using other tempering methods.The first and second glass panes 110, 120 may be tempered before orafter the first glass pane 110 is sealed to the second glass pane 120.In an exemplary embodiment, when the first and second glass panes 110are tempered before they are sealed together, irradiating the panebonding layer 140 with the bonding laser to fuse the pane bonding layer140 does not alter the tempering of the first and second glass panes110, 120 because the bonding laser generates localized heating of thepane bonding layer 140 along the perimeter 119.

As depicted in FIG. 3, the low-emissivity layer 144 may be used to sealthe first glass pane 110 to the second glass pane 120. Referring also toFIGS. 4A-4G, in another method of manufacturing the vacuum insulatedglass unit 100, the pane bonding layer 140 may not need to be depositedonto the vacuum chamber side 112 and an example second glass pane 120comprising the low-emissivity layer 144 may bond with the peripherysurface 117 of the first glass pane 110 to seal the first glass pane 110to the second glass pane 120. The alternative method may also includepositioning the anti-friction mask layer 160 along the perimeter 119 ofthe vacuum chamber side 112 of the first glass pane 110 then depositingthe anti-friction layer 142 on the vacuum chamber side 112. Next, theetching mask layer 150 may be deposited onto the plurality of maskinglocations 152 along the vacuum chamber side 112 of the first glass pane110. The vacuum chamber side 112 of the first glass pane 110 may then becontacted with a chemical etchant, for example, the one or more chemicaletchants described above, to remove a depth of glass pane material fromunmasked portions of the vacuum chamber side 112 of the first glass pane110, such that the vacuum chamber side 112 of the first glass pane 110comprises the etched interior surface 118, the glass pane periphery 116,and the plurality of glass spacers 130. The etching mask layer 150 maythen be removed.

Next, the second glass pane 120 having the low-emissivity layer 144located on the vacuum chamber side 122 of may be positioned in contactwith the periphery surface 117 of the glass pane periphery 116 of thefirst glass pane 110. The portion of the low-emissivity layer 144 of thesecond glass pane 120 contacting the periphery surface 117 of the firstglass pane 110 may be irradiated with a bonding laser to fuse theportions of the low-emissivity layer 144 contacting the glass paneperiphery 116 to seal the first glass pane 110 to the second glass pane120. The bonding laser may be translated such that a contact point (orcontact area) of the laser radiation output by the bonding lasertranslates along the perimeter 119 of the first glass pane 110 to fusethe low-emissivity layer 144 and seal the first glass pane 110 to thesecond glass pane 120 along the entire perimeter 119.

It is noted that recitations herein of a component of the presentdisclosure being “configured” in a particular way, to embody aparticular property, or to function in a particular manner, arestructural recitations, as opposed to recitations of intended use. Morespecifically, the references herein to the manner in which a componentis “configured” denotes an existing physical condition of the componentand, as such, is to be taken as a definite recitation of the structuralcharacteristics of the component.

For the purposes of describing and defining the present invention it isnoted that the term “about” is utilized herein to represent the inherentdegree of uncertainty that may be attributed to any quantitativecomparison, value, measurement, or other representation. The term“about” is also utilized herein to represent the degree by which aquantitative representation may vary from a stated reference withoutresulting in a change in the basic function of the subject matter atissue.

Having described the subject matter of the present disclosure in detailand by reference to specific embodiments thereof, it is noted that thevarious details disclosed herein should not be taken to imply that thesedetails relate to elements that are essential components of the variousembodiments described herein, even in cases where a particular elementis illustrated in each of the drawings that accompany the presentdescription. Further, it will be apparent that modifications andvariations are possible without departing from the scope of the presentdisclosure, including, but not limited to, embodiments defined in theappended claims. More specifically, although some aspects of the presentdisclosure are identified herein as preferred or particularlyadvantageous, it is contemplated that the present disclosure is notnecessarily limited to these aspects.

It is noted that one or more of the following claims utilize the term“wherein” as a transitional phrase. For the purposes of defining thepresent invention, it is noted that this term is introduced in theclaims as an open-ended transitional phrase that is used to introduce arecitation of a series of characteristics of the structure and should beinterpreted in like manner as the more commonly used open-ended preambleterm “comprising.”

It is noted that, while methods are described herein as following aspecific sequence, additional embodiments of the present disclosure arenot limited to any particular sequence.

1. A vacuum insulated glass unit comprising a first glass pane, a secondglass pane, and a pane bonding layer wherein: the first and second glasspanes each comprise a vacuum chamber side opposite an outer side; thevacuum chamber side of the first glass pane comprises an etched interiorsurface, a glass pane periphery comprising a periphery surface, and aplurality of glass spacers each comprising an end surface; the panebonding layer is positioned between and bonded with the peripherysurface of the glass pane periphery of the first glass pane and thevacuum chamber side of the second glass pane, such that the pane bondinglayer couples the first glass pane to the second glass pane; and eachend surface of the plurality of glass spacers and the periphery surfaceof the glass pane periphery are offset from the etched interior surfacesuch that a vacuum chamber is disposed between the etched interiorsurface of the first glass pane and the vacuum chamber side of thesecond glass pane.
 2. The vacuum insulated glass unit of claim 1,wherein the pane bonding layer comprises a low melting point glass, aglass frit, a low-emissivity material, a metal solder, an inorganicmaterial, or combinations thereof.
 3. The vacuum insulated glass unit ofclaim 1, wherein the pane bonding layer comprises a softeningtemperature within a range of temperatures at least partially exclusiveof a range of softening temperatures of the first and second glasspanes.
 4. The vacuum insulated glass unit of claim 1, wherein the panebonding layer comprises a thickness of between about 0.1 μm and about300 μm.
 5. The vacuum insulated glass unit of claim 1, wherein the panebonding layer is compositionally configured to fuse upon absorption ofradiation at a predetermined wavelength.
 6. The vacuum insulated glassunit of claim 1, further comprising an anti-friction layer positioned onthe end surface of at least one of the plurality of glass spacers. 7.The vacuum insulated glass unit of claim 6, wherein the anti-frictionlayer comprises an opaque material.
 8. The vacuum insulated glass unitof claim 1, further comprising a transparent anti-friction layerpositioned on the vacuum chamber side of the second glass pane.
 9. Thevacuum insulated glass unit of claim 1, further comprising alow-emissivity layer positioned on the vacuum chamber side of the firstglass pane, the vacuum chamber side of the second glass pane, or both.10. The vacuum insulated glass unit of claim 1, wherein the first glasspane and the second glass pane each comprise soda lime glass, soda-limefloat glass, alumino silicate glass, borosilicate glass, or acombination thereof.
 11. The vacuum insulated glass unit of claim 1,wherein the first glass pane and the second glass pane each compriseheat tempered glass.
 12. The vacuum insulated glass unit of claim 1,wherein the glass pane periphery is located along a perimeter of thefirst glass pane.
 13. The vacuum insulated glass unit of claim 1,wherein the plurality of glass spacers are positioned in a spacer arraysuch that each glass spacer is positioned between about 10 mm and about100 mm from an adjacent glass spacer.
 14. The vacuum insulated glassunit of claim 1, wherein the end surfaces of the plurality of glassspacers are each offset from the etched interior surface by betweenabout 50 μm and about 300 μm.
 15. The vacuum insulated glass unit ofclaim 1, wherein at least one of the plurality of glass spacerscomprises a load resistance of 1800 kilograms or more.
 16. The vacuuminsulated glass unit of claim 1, wherein each glass spacer of theplurality of glass spacers comprises a thermal transmittance of betweenabout 0.7 W/mK and about 1.1 W/mK.
 17. A method of manufacturing avacuum insulated glass unit, the method comprising: depositing anetching mask layer onto a plurality of masking locations along a vacuumchamber side of a first glass pane; contacting the vacuum chamber sideof the first glass pane with a chemical etchant to remove a depth ofglass pane material from unmasked portions of the vacuum chamber side ofthe first glass pane, such that the vacuum chamber side of the firstglass pane comprises an etched interior surface, a glass pane periphery,and a plurality of glass spacers, wherein the plurality of glass spacersand the glass pane periphery extend from the etched interior surface;removing the etching mask layer; positioning a second glass pane havinga low-emissivity layer on a vacuum chamber side of the second glass panein contact with the glass pane periphery of the first glass pane; andirradiating the low-emissivity layer of the second glass pane contactingthe glass pane periphery of the first glass pane with a bonding laser tofuse the low-emissivity layer contacting the glass pane periphery andseal the first glass pane to the second glass pane.
 18. The method ofmanufacturing the vacuum insulated glass unit of claim 17, wherein thelow-emissivity layer is compositionally configured to fuse uponabsorption of radiation output by the bonding laser to seal the firstglass pane to the second glass pane.
 19. The method of manufacturing thevacuum insulated glass unit of claim 17, wherein the low-emissivitylayer is compositionally configured to reflect radiant heat and permittransmission of visible radiation upon exposure to solar radiation. 20.The method of manufacturing the vacuum insulated glass unit of claim 17,the method further comprising: depositing an anti-friction mask layeralong a perimeter of the vacuum chamber side of the first glass pane;and depositing an anti-friction layer onto the vacuum chamber side ofthe first glass pane before depositing the etching mask layer onto theplurality of masking locations such that after contacting the vacuumchamber side of the first glass pane with the chemical etchant, the endsurfaces of the plurality of glass spacers comprise the anti-frictionlayer.
 21. The method of manufacturing the vacuum insulated glass unitof claim 17, the method further comprising translating the bonding lasersuch that a contact point of laser radiation output by the bonding lasertranslates along a perimeter of the first glass pane at a rate ofbetween about 1 mm/s and about 400 mm/s.
 22. The method of manufacturingthe vacuum insulated glass unit of claim 17, wherein the etching masklayer comprises aluminum, polysilicon, amorphous silicon, siliconcarbide, titanium nitride, acrylate polymers, or a combination thereof.23. The method of manufacturing the vacuum insulated glass unit of claim20, wherein the anti-friction mask layer comprises aluminum,polysilicon, amorphous silicon, silicon carbide, titanium nitride, or acombination thereof and is deposited using a chemical vapor depositionprocess, a photolithographic process, a screen printing process, aninkjet printing process, or a combination thereof.
 24. The method ofmanufacturing the vacuum insulated glass unit of claim 17, furthercomprising contacting the vacuum chamber side of the first glass panewith a fluid to reduce optical distortion through the first glass pane.